Publications
X Author: A.R Krauss
2001
Krauss, A.R, O Auciello, A.M Dhote, J Im, S Aggarwal, Ramamoorthy Ramesh, E.A Irene, Y Gao, and A.H Mueller."Studies of ferroelectric film growth and capacitor interface processes via in situ analytical techniques and correlation with electrical properties."Integrated Ferroelectrics
32 (2001) 121-131.
2000
Aggarwal, S, B Nagaraj, I.G Jenkins, H Li, R.P Sharma, L Salamanca-Riba, Ramamoorthy Ramesh, A.M Dhote, A.R Krauss, and O Auciello."Correlation between oxidation resistance and crystallinity of Ti-Al as a barrier layer for high-density memories."Acta Materialia
48 (2000) 3387-3394. DOI
Auciello, O, A.R Krauss, J Im, A Dhote, D.M Gruen, E.A Irene, Y Gao, A.H Mueller, and Ramamoorthy Ramesh."Studies of ferroelectric heterostructure thin films and interfaces, via in situ analytical techniques."Integrated Ferroelectrics
28 (2000) 1-12. DOI
1999
Auciello, O, A.R Krauss, I.M Jaemo, A Dhote, D.M Gruen, S Aggarwal, Ramamoorthy Ramesh, E.A Irene, Y Gao, and A.H Mueller."Studies of ferroelectric heterostructure thin films, interfaces, and device-related processes via in situ analytical techniques."Integrated Ferroelectrics
27 (1999) 103-118. DOI
Krauss, A.R, A Dhote, O Auciello, J Im, Ramamoorthy Ramesh, and S Aggarwal."Studies of hydrogen-induced degradation processes in Pb(Zr1-xTix)O3 (PZT) and SrBi2Ta2O9 (SBT) ferroelectric film-based capacitors."Integrated Ferroelectrics
27 (1999) 147-157. DOI
Dhote, A.M, A.R Krauss, O Auciello, J Im, D.M Gruen, Ramamoorthy Ramesh, S.P Pai, and T Venkatesan."Studies of metallic species incorporation during growth of SrBi2Ta2O9 films on YBa2Cu3O7-x substrates using mass spectroscopy of recoiled ions."Materials Research Society Symposium - Proceedings
541 (1999) 281-286.
1998
Im, J, A.R Krauss, A.M Dhote, D.M Gruen, O Auciello, Ramamoorthy Ramesh, and R.P.H Chang."Studies of metallic species and oxygen incorporation during sputter-deposition of SrBi2Ta2O9 films, using mass spectroscopy of recoiled ions."Applied Physics Letters
72 (1998) 2529-2531. DOI