Publication Type:Journal Article
Source:Applied Physics Letters, American Institute of Physics Inc., Woodbury, Volume 74, Number 20, p.3023-3025 (1999)
Keywords:annealing, Capacitors, Dielectric films, electrochemical electrodes, Ferroelectric capacitors, Ferroelectric devices, ferroelectricity, Forming gas anneals (FGA), Hydrogen, lanthanum compounds, Lead compounds, Polarization, Strontium compounds
The use of (La,Sr)CoO3 (LSCO) oxide electrodes as diffusion barriers to hydrogen is investigated during forming gas anneals (FGA). After FGA, almost no bipolar fatigue up to 1011 cycles, good logic state retention, and no imprint at 100 °C are exhibited by the ferroelectric capacitors.
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