Layered Cu-based electrode for high-dielectric constant oxide thin film-based devices

Publication Type:

Journal Article

Source:

Applied Physics Letters, Volume 82, Number 9, p.1452-1454 (2003)

Abstract:

The integration of amorphous Ti-Al was investigated for Cu for fabrication of oxide thin film-based capacitors. The Cu and Ta layers remained intact through high temperature oxygen annealing due to the thin oxide layer formed on the Ti-Al surface. The results demonstrated that the Ti-Al/Cu/Ta layered structure provided a good alternative electrode technology to Pt for the fabrication of BST capacitors.

Notes:

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