Publication Type:Conference Paper
Source:Journal of Physics: Conference Series, Institute of Physics Publishing, Volume 592, Number 1 (2014)
Keywords:Antiferromagnetic domains, Antiferromagnetism, Domain walls, Electron microscopes, electron microscopy, electrons, Ferroelectric domain structure, Ferroelectric domains, Ferroelectric materials, ferroelectricity, Long range orders, Magnetic domains, Magnetic ordering temperatures, Multiferroic phase, Neel temperature, Photoemission, Photoemission electron microscopy, temperature, Temperature dependent
Low-temperature photoemission electron microscopy (PEEM) is used to image and compare the distribution of ferroelectric domains in multiferroic ErMnO3 above and below the magnetic ordering temperature (TN =80 K). Our temperature-dependent PEEM data demonstrate that the ferroelectric domain structure is robust against the onset of magnetic long- range order and the emergence of antiferromagnetic domains. The observed persistence indicates that antiferromagnetic domain walls adopt the position of ferroelectric walls-and not vice versa-developing a multiferroic domain-wall pattern congruent with the ferroelectric domain-wall distribution observed above TN.
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